Stress Workshop 2010

Co-Chairs

Ehrenfried Zschech, Fraunhofer IZFP, Dresden, Germany
Paul Ho, UT Austin/TX, US
Shinichi Ogawa, Selete, Tsukuba, Japan
  

Program Committee

Reinhold Dauskardt, Stanford Univ., CA, US
Martin Gall, Freescale, Fishkill/NY, US
Hisao Kawasaki, Mitsubishi, Japan
Oliver Kraft, KIT, Karlsruhe, Germany
Kazuhiro Ito, Kyoto Univ., Japan
Young-Chang Joo, NSU Seoul, Korea
Klaus-Dieter Lang, Fraunhofer IZM, Berlin, Germany
Jon Molina, IMDEA Materials, Madrid, Spain
Tomiji Nakamura, Fujitsu, Tokyo, Japan
Tony Oates, TSMC, Hsinchu, Taiwan
Young-Bae Park, Andong Nat. Univ., Korea
Bob Rosenberg, IBM Yorktown Heights/NY, US
Ralph Spolenak, ETH Zuerich, Switzerland
Valeriy Sukharev, Mentor Graphics, San Jose/CA, US
Olivier Thomas, Univ. Marseille, France
King-Ning Tu, UCLA, Los Angeles/CA, US
Cynthia Volkert, Univ. Goettingen, Germany
Shinji Yokogawa, NEC Electronics, Japan
  
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